QLIFE®
Health & Beauty Products
LINSEED
FACIAL MOISTURIZING CREAM
Essential Daily Extra Gentle
Protective Moisturizer
With Proprietary* Linseed
Double Biocomplex
1.7 FL OZ (50 mL)
No Animal Testing
pH Balanced
A UNIQUE, TRIPLE-BIOACTIVE
FORMULA, CONTAINING
A PROPRIETARY* LINSEED
DOUBLE BIOCOMPLEX.
MAINTAINS THE PROPER
LEVEL OF MOISTURE, ENSURES OPTIMAL
SKIN NUTRITION,
AND PROTECTS SKIN FROM ELEMENTS.
MAKES A PERFECT
GIFT.
Recommendations:
Extra gentle and extra
light moisturizing cream recommended for delicate, dry to combination skin.
Contains the proprietary* linseed double biocomplex in combination with
a special moisturizing formula (NMF), natural vitamin E, and UVA/UVB filters.
This optimal combination prevents premature aging of the skin, maintains
the proper level of moisture, ensures appropriate skin nutrition, and protects
skin from elements. When regularly used, it firms and soothes the skin
and reduces its tendency for flakiness. Excellent for daily use as a moisturizing
and protecting cream, ideally suited as a makeup base. Recommended for
use throughout all seasons. Moderately protects against sun's UV
radiation.
Directions: Apply
daily to face and neck. Perfect alone or as a makeup base.
For best results use with as the third step after cleansing with QLIFE®
Facial
Cleansing Lotion and toning with QLIFE®
Tonic.
Warning:
External use only. Avoid contact with eyes. Keep out of reach
of children.
Discontinue use if irritation occurs.
Ingredients:
Water, Polyglyceryl-3
Methyl Glucose Distearate, Proprietary* Mixture of Linum Usitatissimum
Extract and Linum Usitatissimum Oil, Collagen, Cetyl Alcohol, Glycerol,
a–Tocopheryl Acetate (Vitamin E), Sodium Lactate /and/ Sodium PCA /and/
Glycine /and/ Fructose /and/ Urea /and/ Niacinamide /and/ Inositol /and/
Sodium Benzoate /and/ Lactic Acid, Phenoxyethanol, Butylparaben /and/ Ethylparaben
/and/ Methylparaben /and/ Propylparaben, Octyl Methoxycinnamate, Benzophenone,
Tetrahydroxypropyl Ethylenediamine, Carbomer, Antioxidant, Fragrance.
___________________________
*US
and Intnl. Patents Pending
|